TSG Releases Strategic Growth Opportunities on Atomic Layer Deposition
Atlanta, GA, June 27, 2007 --(PR.com)-- TSG today announced the release of its findings on Strategic Growth Opportunities in the attractive growth market of Atomic Layer Deposition (ALD).
TSG defines Atomic Layer Deposition (ALD) to include sequential pulsing of chemical vapors that results in the formation of about one atomic layer for each pulse. This generates highly uniform coatings that can be applied deep inside pores, trenches and cavities.
ALD has benefits for a broad range of industries – Semiconductors, Nanotechnology, Fuel Cells, Optics, Chemicals, Aerospace, etc. – and across a variety of applications – corrosion and diffusion barriers, low temperature coatings, filling and coating nanotubes and nanowires, ultrathin foils, electrical insulators, flat panel displays using thin film electroluminescent technology, etc.
“ALD is a disruptive technology that is already impacting semiconductor and display manufacturing, and it has the potential to impact many other manufacturing processes,” says Seth Taylor, Ph.D./MBA, Principal of TSG.
According to TSG, ALD is an attractive growth market in the chemical vapor deposition (CVD) market, as it is likely to grow from its base of $214M in 2005 to $617M by 2010. While existing markets such as semiconductors and optics are likely to show continuing growth with ALD, TSG expects new areas, such as Biomedical/Biotechnology, Energy and Catalytic Surfaces, to show promising potential growth.
TSG has identified key trends and growth drivers for ALD:
- Double digit growth is expected based on strong adoption of ALD.
- Raw materials is the fastest growing sector and this is driven by the volume of ALD production.
- The emergence of premium priced products based on new technologies, such as non-planar 3D transistors, is driving demand.
- A big wave of consolidation is likely as the industry converges on a number of big players in five years, leading IP to be a potential issue.
TSG suggests that companies have the potential to enable production of new types of surfaces and processes to accelerate the adoption of ALD as a manufacturing platform.
For more information on Atomic Layer Deposition and other market insights, visit TSG’s website www.tsg-partners.com.
About TSG
TSG is a specialty advisory group that combines corporate strategy and corporate finance to create shareholder value for companies and investors in the life sciences, biotechnology, healthcare and wellness sectors. TSG’s approach is based on a combination of independent analysis of the markets and customer needs, a deep appreciation of the technology landscape, operational plans that are defensible and stress-tested, and the capital markets environment. TSG’s focus on growth aims at developing a holistic approach that takes into account internal efforts, alliances, collaborations and strategic transaction opportunities. TSG has presence in Atlanta, Boston and Silicon Valley. www.tsg-partners.com
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TSG defines Atomic Layer Deposition (ALD) to include sequential pulsing of chemical vapors that results in the formation of about one atomic layer for each pulse. This generates highly uniform coatings that can be applied deep inside pores, trenches and cavities.
ALD has benefits for a broad range of industries – Semiconductors, Nanotechnology, Fuel Cells, Optics, Chemicals, Aerospace, etc. – and across a variety of applications – corrosion and diffusion barriers, low temperature coatings, filling and coating nanotubes and nanowires, ultrathin foils, electrical insulators, flat panel displays using thin film electroluminescent technology, etc.
“ALD is a disruptive technology that is already impacting semiconductor and display manufacturing, and it has the potential to impact many other manufacturing processes,” says Seth Taylor, Ph.D./MBA, Principal of TSG.
According to TSG, ALD is an attractive growth market in the chemical vapor deposition (CVD) market, as it is likely to grow from its base of $214M in 2005 to $617M by 2010. While existing markets such as semiconductors and optics are likely to show continuing growth with ALD, TSG expects new areas, such as Biomedical/Biotechnology, Energy and Catalytic Surfaces, to show promising potential growth.
TSG has identified key trends and growth drivers for ALD:
- Double digit growth is expected based on strong adoption of ALD.
- Raw materials is the fastest growing sector and this is driven by the volume of ALD production.
- The emergence of premium priced products based on new technologies, such as non-planar 3D transistors, is driving demand.
- A big wave of consolidation is likely as the industry converges on a number of big players in five years, leading IP to be a potential issue.
TSG suggests that companies have the potential to enable production of new types of surfaces and processes to accelerate the adoption of ALD as a manufacturing platform.
For more information on Atomic Layer Deposition and other market insights, visit TSG’s website www.tsg-partners.com.
About TSG
TSG is a specialty advisory group that combines corporate strategy and corporate finance to create shareholder value for companies and investors in the life sciences, biotechnology, healthcare and wellness sectors. TSG’s approach is based on a combination of independent analysis of the markets and customer needs, a deep appreciation of the technology landscape, operational plans that are defensible and stress-tested, and the capital markets environment. TSG’s focus on growth aims at developing a holistic approach that takes into account internal efforts, alliances, collaborations and strategic transaction opportunities. TSG has presence in Atlanta, Boston and Silicon Valley. www.tsg-partners.com
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Contact
TSG
Kasey Chow
1-404-995-6709
www.tsg-partners.com
Kasey Chow
1-404-995-6709
www.tsg-partners.com
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